Used AMAT / APPLIED MATERIALS 0010-16893 / 0195-01037 #293666362 for sale

AMAT / APPLIED MATERIALS 0010-16893 / 0195-01037 is a chemical vapor deposition (CVD) reactor that is used to deposit thin-film materials. The reactor is ideal for the production of high performance thin-film products such as semiconductors, optoelectronic, display, glass, and ceramic materials. It has a 200 mm vertical design that features a split cassette, allowing for simultaneous loading of substrates from both the top and bottom. By utilizing a split cassette design, the reactor offers an increased volume, allowing for simultaneous treatment of multiple substrates in one cycle, reducing cycle time and cost. The reactor also features a low-angle magnetic field technology, which has been proven to provide excellent plasma uniformity and reduced particle contamination across the entire wafer. The low-angle magnetic field also helps to improve the uniformity of the films, as well as reduce the number of defects caused by particles deposited on the wafer. Furthermore, AMAT 0010-16893 / 0195-01037 has a single-chamber design which is designed for long-term and reliable operation. The chamber is equipped with a multi-zone heating equipment, providing a uniform temperature profile for precise temperature control. This feature allows for excellent material deposition reproducibility. The chamber also includes an automated ambient gas delivery system, which allows for a controlled workflow and excellent process control. Furthermore, the chamber includes a patented plasma source design, which helps to suppress electrical discharge noise and ensure stable plasma production. The reactor also offers multi-point pressure control for accurate process control. In addition, the reactor is equipped with a high-duty activity alarm unit, which monitors the reactor to ensure safety and reliability. The alarm machine also provides an additional layer of automation through its ability to communicate with external processing systems. Overall, APPLIED MATERIALS 0010-16893 / 0195-01037 is an advanced CVD reactor designed for the production of high-performance thin-film products. It offers a 200 mm vertical design with a split cassette and low-angle magnetic field technology, allowing for rapid wafer processing without any loss in uniformity or particle contamination. Furthermore, the reactor provides excellent temperature stability, precise process control, and advanced safety alarm systems to ensure a reliable production environment.