Used AMAT / APPLIED MATERIALS 0010-17798 #9112022 for sale

AMAT / APPLIED MATERIALS 0010-17798 is a reactor that works on the principles of chemical vapour deposition (CVD). It is used to create thin layers of materials and films. CVD is a technique where gaseous precursors are introduced in a reactor chamber and then react to form a solid material on the substrate. AMAT 0010-17798 was designed with specific features to make it suitable for a variety of CVD processes. The design of the reactor consists of a refillable chamber, a process tank and an exhaust. The refillable chamber contains the gaseous precursors, while the process tank contains the substrate material. The gases and the substrate material react chemically in the process tank. The exhaust allows the by-products of the CVD reaction to escape from the system. The substrate chamber is designed to function under high temperatures. It is insulated by a ferro-ceramic lining to reduce thermal losses and protect the vessel from oxidation. The refillable chamber is sealed to minimise the risk of leakage of toxic chemicals, and it can be filled with a variety of chemicals, depending on the process requirements. The reactor also has a number of safety features. The system is designed with a fail-safe device and an emergency shut-off switch. The fail-safe device is activated when there is an interruption in the process and the emergency switch can be used to manually shut down the system. These features prevent any process failure or safety hazard. The reactor has a high degree of flexibility and can be used for a wide variety of CVD processes. It can be used for processes such as low-temperature deposition, plasma solutions and wet chemical processes. This makes it a versatile and efficient tool for a variety of applications. Overall, APPLIED MATERIALS 0010-17798 reactor is an essential tool for CVD processes. It is well-constructed, reliable and easy to use, making it an ideal tool for a variety of CVD processes.