Used AMAT / APPLIED MATERIALS 0010-20211 #293652029 for sale

AMAT reactor AMAT / APPLIED MATERIALS 0010-20211 is an advanced, high-efficiency tool used in semiconductor fabrication, typically used in semiconductor material deposition. AMAT 0010-20211 is capable of running at a maximum temperature of 1000°C, and is equipped with a precise temperature control system that allows precise control of deposition thickness and process times as well as uniform, precise coating conditions. The reactor also features a range of sensors and data logging equipment, allowing for precise process monitoring and analysis. The reactor is constructed from quality materials and components, and is sealed to ensure integrity. Its efficient design allows for quick start up and shut down times as well as energy savings. The reactor has been designed to reduce particle generation, meaning fewer process steps are required and fewer reparations are needed. Additionally, APPLIED MATERIALS 0010-20211 is equipped with automation and robotics, allowing it to operate unattended to reduce labor costs. 0010-20211 is designed to perform both physical and chemical vapor deposition (PVD & CVD). Its physical vapor deposition capabilities include the deposition of metals, metal alloy and dielectric compounds onto metallic and non-metallic substrates. Its chemical vapor deposition capabilities include polysilicon, boron nitride, non-stoichiometric silicides, and more, with general applications such as gate oxides, memory layers, diffusion layers, and other device elements. AMAT / APPLIED MATERIALS 0010-20211 is designed for increased safety, with safety interlocks, an anti-contamination system, and other safety features. Additionally, the reactor has a number of quality control features, such as temperature and pressure monitoring and control, as well as advanced visual data logging features. AMAT 0010-20211 is also equipped with digital diagnostics, allowing for real-time data analysis and monitoring, providing users with fast and accurate feedback on their process results. In conclusion, APPLIED MATERIALS 0010-20211 reactor is a highly advanced, efficient tool for semiconductor fabrication. It is capable of both physical and chemical vapor deposition, is made from quality components, and is constructed with safety and precision in mind. It also features advanced automation, robotics and data logging, reducing labor costs and improving accuracy and speed of results.