Used AMAT / APPLIED MATERIALS 0010-21246 #9378778 for sale

AMAT / APPLIED MATERIALS 0010-21246 Reactor is a sophisticated piece of equipment designed for the deposition of thin films on substrates for advanced research and production applications. The reactor can be used in a variety of processes such as Atomic Layer Deposition (ALD), Physical Vapor Deposition (PVD), Low Pressure Chemical Vapor Deposition (LPCVD), and Ultra High Vacuum (UHV). The exterior of the reactor is constructed from stainless steel and has an isolation chamber which is equipped with a vacuum equipment for the deposition process. An Advanced Process Control (APC) system is used to control the required parameters needed for the chosen process such as pressure, temperature, and flow rate and provides real-time monitoring of the operations with a user-friendly interface. The interior of the reactor is comprised of a mechanism which allows for the precise delivery of a precursor material for ALD or CVD and the creation of a deposition arc in PVD processes. The nozzle designed for deposition has two configurations, multi-port for CVD processes or single-port for ALD processes. Depending on the substrate material and size, a rotating or non-rotating substrate holder may be used to ensure uniform film deposition. AMAT 0010-21246 reactor is equipped with a range of devices such as a pulsed electron beam source, mass spectrometer, heated pumping unit, and an automated gas buffer machine. These features give the user control over operating conditions such as temperature of the substrate and the pressure and flow of the gas used in the process. The reactor is ultimately an efficient and accurate piece of machinery for films deposition and provides great flexibility as the user can quickly adjust parameters and operations with the help of the Advanced Process Control tool. The intricate components of the machinery are ideal for the production of thin films with high repeatable uniformity and excellent adhesion to substrates.