Used AMAT / APPLIED MATERIALS 0010-23716 #293810759 for sale
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AMAT / APPLIED MATERIALS 0010-23716 Reactor is a sophisticated equipment used in the manufacture of semiconductor and metal materials used in the electronics industry. It is an ultra-high vacuum system designed to create vacuum levels as low as 10-7 Torr, enabling the deposition of ultra-thin films. It consists of a multi-chamber unit with a 6-inch reaction chamber, three 15-inch chamber ports, several process gases, 13-Megawatt heating assemblies, and various power supplies and gauges. This machine is capable of process temperatures ranging from room temperature up to 250° C, allowing for a variety of deposition methods. The reaction chamber is made of stainless steel and is heated by a 13 MW assembly, creating an even temperature distribution throughout the chamber. A high-pressure gas injection tool ensures uniform gas distribution and is employed for both etching and deposition processes. The per-process rate is variable and adjustable, enabling the deposition of complex structures over a wide range of temperatures. The three 15-inch chamber ports allow for additional gas and process components to be introduced to the environment. These components include windowless glow discharge valves, wafer orientation devices, and microscopes for in-situ inspection. The environment within the reaction chamber is atomically clean, reducing the risk of contamination during any process step. The reactor also includes two general-purpose power supplies, a high-efficiency programmable power supply, and additional power components to help control and manipulate the various process gases and temperatures. The gauges installed in the reactor monitor several process parameters such as pressure, temperature, and gas composition, allowing for both real time and post-processing analysis. AMAT 0010-23716 Reactor is an important tool for the semiconductor industry. It provides a high degree of process control and accuracy while maintaining excellent vacuum performance. Its versatility and robust construction make it an excellent solution for many thin film fabrication applications, making it a valuable device for the industry.
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