Used AMAT / APPLIED MATERIALS 0010-27430 #293640039 for sale

AMAT / APPLIED MATERIALS 0010-27430 reactor is a single chamber multiwafer reactor designed for both etch and deposition processing of materials. This reactor is designed to make the deposition of thin films and the etching of structures easier and more efficient. The reactor is designed with a number of features in order to control the processing environment to the nanometer level for thin films and microstructures. The reactor can be customized for specific processes depending on the specific requirements of the customer. Each reactor chamber is sealed to prevent any contamination from entering and creating contamination on the inside of the chamber. The chamber is formed from a rigid frame and ceramic or metal plates, which serves to evenly distribute the temperature and heat throughout the chamber. This helps to keep reproducible process recipes when processing thin films and other materials. AMAT 0010-27430 reactor can process single or double sided wafers. It is equipped with an adjustable gas flow system that enables the operator to control the flow of the gas in order to customize the process according to the specific requirements of the customer. The reactor has an integrated temperature control system which monitors and controls the temperature of the chamber. The temperature of the chamber can be adjusted depending on the specific requirements of the customer. This temperature control system ensures uniform temperatures throughout the chamber, which helps in uniform deposition of thin films and structures. APPLIED MATERIALS 0010-27430 reactor also has a computer-controlled interface which simplifies the process of controlling the many aspects of the fabrication process. This interface is user-friendly and provides the operator with real-time access to all the necessary process data. 0010-27430 reactor has been designed for versatile and reliable production of thin films and structures for a variety of industries. The reactor is designed with a number of features which enable it to offer efficient, precise, and uniform processing of materials with minimum waste. This makes the reactor ideal for a variety of applications such as microelectronics, biomedical and optical coating, and more.