Used AMAT / APPLIED MATERIALS 0010-27983 #293724910 for sale

AMAT / APPLIED MATERIALS 0010-27983 is a reactive ion etch (RIE) reactor designed for semiconductor manufacturing applications. The reactor utilizes four distinct chamber sections. An upper section, containing a gas line, provides a supply of reaction materials to the reaction chamber. A lower section contains a vacuum manifold/pump equipment for chamber evacuation and maintenance. The reaction chamber is sealed and provided with inert gas sources, allowing for control of environment during etching processes, thus ensuring precision etching of material. AMAT 0010-27983 RIE reactor has a chamber temperature range of 50-400 degrees Celsius and is capable of accommodating a wide variety of wafer sizes and shapes. The power supplies, ranging from DC to RF, can be precisely adjusted to produce precise etching results for a variety of materials. Reactive gases can be introduced to the reaction chamber through the gas line with corresponding flow controllers to regulate the gas mix and pressure. Additionally, the system comes with an automated wafer handling unit which is coupled to a robotic arm, enabling automated loading and removal of the wafers from the reaction chamber. To further improve etching accuracy, the machine provides for additional customization options such as robotic support structures, shielding, and adjustable shelving positions for optimal wafer follow-up. APPLIED MATERIALS 0010-27983 RIE reactor also offers a modular design, allowing for easy integration to existing systems, as well as expanding the production capability. In order to ensure optimal process performance and reliability, 0010-27983 reactor is factory tested with certified ISO 9000-compliant quality standards. Moreover, the tool is designed to accept upgrades and upgrades offer extended chamber size, increased safety levels, improved process flows, and improved temperature stability. Overall, AMAT / APPLIED MATERIALS 0010-27983 RIE reactor is an ideal tool for efficient and precise etching of semiconductor materials. It is designed with multiple specialized features including automated wafer handling, adjustable shelving positions and shieldings, and modular design that ensures optimal process performance. Moreover, the asset is thoroughly tested and quality controlled to ensure reliability and safety.