Used AMAT / APPLIED MATERIALS 0010-30094 #293658018 for sale

AMAT / APPLIED MATERIALS 0010-30094
ID: 293658018
Spare part for P5000.
AMAT / APPLIED MATERIALS 0010-30094 reactor is a highly efficient and versatile tool used for the deposition of thin films on substrates. This reactor is a Metal-Organic Chemical Vapor Deposition (MOCVD) equipment, which means it uses chemical reactions to create and deposit layers of material onto a substrate. The reactor consists of a multiple-chamber system with multiple configuration options, allowing for greater flexibility when coating substrates. The core of the reactor is a deposition chamber, which houses the substrate for coating. This chamber is equipped with multiple heating sources, including lamp heater, quartz heater, and hot and cold walls, to accurately manage the temperature of the substrate. Additionally, the chamber is coupled with a power delivery unit, which applies the electric power needed to generate the chemical reactions that form the thin films. The interface between the deposition chamber and the external environment is a vacuum transfer chamber. This chamber is equipped with a mechanical booster pump and a cryogenic cooling machine to maintain the desired vacuum pressure and temperature range. The transfer chamber also enables the automated movement of the substrate from the deposition chamber to the external environment for cooling and testing. The reactor is designed to work with a wide variety of substrate materials, such as glass, ceramics, and metals. It can also handle large substrates, up to 450mm in size. It is capable of depositing thick layers of multiple target materials at a time, up to 10nm thick for each layer. The deposition rate is variable and can be set according to the desired layer thickness. Additionally, this reactor has been specifically designed for ultra-clean operation, to deposit films with uniform substrates and low contamination levels. AMAT 0010-30094 reactor is an excellent tool for deposition processes, offering high-precision control and versatility. It is capable of producing thin films for a wide range of thin film applications, such as optical coatings, semiconductors, and optoelectronics, with great accuracy and efficiency. The multiple heating systems, power delivery tool, and vacuum control capabilities make it highly reliable and user-friendly.
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