Used AMAT / APPLIED MATERIALS 0010-30094 #9026410 for sale

AMAT / APPLIED MATERIALS 0010-30094 is a precision reactor designed for substrate processing applications such as dry etching, deposition, and oxidation. AMAT 0010-30094 utilizes a specially designed dual-stage vacuum chamber, equipped with two independent vacuum pumps to achieve incredibly high vacuums. The effect is a uniform and precise process environment with unparalleled results. The 550mm-diameter chamber has a balanced linear energy distribution with uniform processing along the entire substrate. This allows for higher etch rates and better uniformity across the entire wafer. In addition, the chamber is equipped with an embedded cooling equipment to control process temperatures accurately and effectively. In addition to the dual-stage vacuum chamber, APPLIED MATERIALS 0010-30094 also features a number of optional components to fit a variety of processing needs. A gas delivery system can be installed to feed process gases into the chamber and monitor pressure and flow rates. This ensures each step of the process is done under the proper chemical environment. An automated wafer transfer unit can also be implemented to load and unload substrates. This machine can be used to move substrates between chambers to perform more intricate processes. 0010-30094 can also be equipped with a diagnostic tool to monitor in real-time etch, deposition, and temperature processes. This diagnostic asset uses pressure and temperature sensors as well as E-beam and ionization gauges to monitor chamber conditions. AMAT / APPLIED MATERIALS 0010-30094 is an ideal reactor choice for specialized processing that requires high levels of precision. This sophisticated reactor uses state-of-the-art technology and processes to yield reliable results, giving users greater control over their processes. From basic etching to complex deposition, AMAT 0010-30094 provides users with top-notch performance and dependability.