Used AMAT / APPLIED MATERIALS 0010-30125 #9277735 for sale

AMAT / APPLIED MATERIALS 0010-30125 is a high speed reaction chamber used for rapid and precise depositions of thin films. It utilizes a mixture of chemical gas and energy sources to produce the desired characteristics of a thin film, such as uniformity, optical and electrical properties. This reactor chamber is specifically designed for cost-effective processes, allowing for low cost-per-area deposition rates. The reactor chamber is constructed of stainless steel, providing a temperature-resistant housing. An inert gas blanket system is present in order to maintain stability during operation and prevent unwanted oxidation and contamination. Additionally, a vacuum pump pulls air out of the chamber, enabling a desired pressure for the reaction. This chamber is typically heated up to 650°C during operations, further aiding the reaction process. The primary elements at the heart of this chamber are the wafer heater, inductively coupled plasma, (ICP) generator, showerhead, high-frequency, and low frequency high voltage generators, as well as the associated electrodes, coils, and gas lines. The wafer heater maintains a uniform temperature on the wafers, while the inductively coupled plasma generator produces a uniform plasma of positively charged ions and electrons. The showerhead then directs the plasma towards the wafers. During the process, high-frequency and low frequency generators supply electrical energy to the electrodes, leading to a cascading reaction with the plasma particles. Once the desired copper thin film has been deposited, the gases and electrical energy can be shut off, allowing for a rapid turnover of wafer processing. In summary, AMAT 0010-30125 is a high-speed reaction chamber designed for rapid deposition of thin films in an effective and cost-efficient manner. Its components combine to enable precise, controllable thin film deposition through a cascading reaction involving plasma, electrical energy, and temperature-controlled gases.