Used AMAT / APPLIED MATERIALS 0010-30686 #293635611 for sale

AMAT / APPLIED MATERIALS 0010-30686 is a single wafer batch chemical vapor deposition (CVD) equipment designed for process flexibility and the highest possible process performance. This reactor structure is made from stainless steel and is gas-tight for use with corrosive materials. This system enables the deposition of films on substrates with a uniformity of height and perfectly smooth substrate surfaces at high rate deposition and at high temperature. The unit is a one-cassette design, with access to both process and load lock chambers. The process chamber provides a two-zone configuration for standard epitaxial and advanced process chemistries and a three-zone configuration for specialty process chemistries. The load lock chamber features a multi-purpose in-situ-processing chamber and has multiple ports for process gases, pumps, and other accessories. AMAT 0010-30686 reactor includes a gas box to house the gas delivery and monitoring systems. This gas box is temperature-controlled and includes particle filtration, pressure, and flow control. It also includes a gas mixing manifold with electronic flow control and pressure transducers. The machine has all the electronics automations, algorithms and advanced software technology. It supports high-speed etch and deposition recipes with up to seven gases, as well as multiple chamber capabilities. Features include an integrated chiller for thermal uniformity, integrated load port support for maximized upper-bath loading, multi-zone process control with Quad-zone wall control integration, and automatic recipe optimization. In terms of safety and reliability, this tool has alarm systems, safety interlocks, voltage interlocks, and process monitoring systems to ensure a safe and reliable operation. Additionally, the reactor is designed for low energy usage and an efficient operation. This asset also has a modular design for easy maintenance and service. Overall, APPLIED MATERIALS 0010-30686 reactor is a reliable and efficient model for the fabrication of high-quality films. Its advanced process chemistries, multi-zone processes, gas box temperature-controlled design, safety interlocks and alarms, and optimized recipe automation make it an ideal equipment for the deposition of films on substrates with uniformity and superior surface smoothness.