Used AMAT / APPLIED MATERIALS 0010-36162 #152194 for sale

AMAT / APPLIED MATERIALS 0010-36162 is a high temperature chemical vapor deposition (CVD) reactor that is used for a wide range of industrial applications. The reactor is capable of temperatures up to 1000° C and is equipped with multiple safety systems to ensure safe operation. It is designed to provide excellent process control and uniformity while offering precise control over a variety of process parameters. The reactor has a stainless steel body that is lined with ceramic insulation, providing a stable and efficient interior environment for CVD processes. Its robust design is suitable for a wide range of manufacturing processes such as copper, silicon and III-V compound semiconductor materials. The reactor also features an oxygen flow equipment to controllably introduce oxygen into the process during certain production stages. AMAT 0010-36162 is also equipped with a gas distribution plate and a gas supply system. The gas distribution plate allows for precise distribution of gases for CVD growth and can be adjusted to precisely control the deposition rate and uniformity across the substrate. The automated temperature control unit features multiple sensors and precise feedback loops that can reach up to 100 mbar and a temperature range of up to 1000° C. The reactor also has a computerized process control unit (PCU) that helps the user to monitor and control their CVD processes in real-time. This PCU is designed to be automated and user-friendly, allowing the user to set up, run and monitor CVD processes quickly and efficiently. APPLIED MATERIALS 0010-36162 reactor is ideal for a wide range of industries who require precise temperature control and uniformity in order to manufacture high quality parts or products in a quick and cost effective manner. The reactor is built with reliable components, a robust design and a computerized process control machine that make it an excellent choice for professional, semi-professional and even hobbyist users.