Used AMAT / APPLIED MATERIALS 0010-36162 #180798 for sale

AMAT / APPLIED MATERIALS 0010-36162 is a high-temperature chemical vapor deposition CVD reactor that is used to deposit a variety of thin films used in semiconductor device fabrication. It is specifically designed for materials such as amorphous silicon, polysilicon, and other varietal films. The solid state process control features and advanced process control architecture provide superior metrology control and yield performance. The small footprint and limited resource requirements lend this tool to labs with limited space. AMAT 0010-36162 utilizes an electron cyclotron resonance (ECR) technology that reduces the impurities, gas phase growth rate, and higher quality films to deposit the films needed to produce semiconductors. The ECR is powered by a linear RF equipment capable of providing 4-8 GHz, 450 W of process power. This system is ideal for robust deposition control and uniformity. The CVD reactor unit can operate as high as 1250°C, perfect for depositing films such as GaN or SiC with high quality and uniformity. The machine also has numerous safety features that protect the deposition film from being ruined including multi-zone cooling, a gas-based safety tool, backside cooling, and built-in diagnostics. APPLIED MATERIALS 0010-36162 provides a unique set of features to help achieve higher productivity, more uniform films, more repeatable films, and improved process control. The chamber size can be fitted with a 2" wafer robot to increase density and throughput. The additional tooling options made available are compatible with the CVD chamber and are designed to eliminate the need for manual handling. These options also improve yield and throughput by providing improved uniformity. 0010-36162 is capable of controllable temperature and pressure which is vital for process and uniformity control. The adjustable power supply makes it easier to control the deposition rate and maintain a consistent temperature in the CVD reactor. The quick-change module for process gases adds a unique layer of flexibility for the users and makes it easy to switch from one process to another. Overall, AMAT / APPLIED MATERIALS 0010-36162 is a powerful, robust, and flexible CVD reactor that offers users the best in terms of process control and yield performance. The advanced features and capabilities of the asset make it an ideal addition to any laboratory environment.