Used AMAT / APPLIED MATERIALS 0010-36162 #9026413 for sale

AMAT / APPLIED MATERIALS 0010-36162 is a complete low-pressure chemical vapor deposition (LPCVD) equipment designed specifically for large-scale production of thin films. The system consists of six components - a furnace, a gas control unit, a controller, a vacuum chamber, a delivery unit and a vacuum reservoir. Each component works together to allow for precise control of process parameters, enabling the machine to reduce costs, improve yields and increase throughput. The furnace is the primary temperature control unit of the tool and provides a uniform temperature profile for LPCVD processes. It is designed to withstand high temperatures and can be used for the deposition of silicon oxide, nitride and silicon-germanium films. The gas control unit is designed to accurately mix and coregulate gas flows at specified temperatures. Precise control of the process gases is achieved using a combination of mass flow controllers and mechanical valves. The controller is a computer-controlled digital logic controller which coordinates the operation of asset components. The controller monitors and measures process parameters and is used to program recipes, monitor operational performance, and control process times and product quality. The vacuum chamber is a custom aluminum chamber with a stainless steel liner. It is designed to provide an ultra-high vacuum environment for the deposition process. The delivery model is a flexible, high-pressure equipment designed to deliver process gases at up to 14 bar, enabling increased yield with decreased processing time. It features a high-pressure, gas on-demand system which automatically delivers process gases when required. The vacuum reservoir is designed to reduce the need for rough pumps in the processing chamber. The unit is intended to reduce machine cycle time and improve process reliability. Overall, AMAT 0010-36162 LPCVD tool is a fully automated, high-performance asset designed to accommodate large-scale production of thin films. Its components are integrated into a compact model which provides precise control of process parameters, increases throughput, reduces costs and enhances product quality.