Used AMAT / APPLIED MATERIALS 0010-36162 #9075364 for sale

AMAT / APPLIED MATERIALS 0010-36162 is a vertical low pressure chemical vapor deposition (LP-CVD) reactor designed to provide the highest quality growth of ultra-high purity, poly-crystalline silicon films for the semiconductor industry. Its unique features make it one of the most versatile LP-CVD reactors available. AMAT 0010-36162 reactor has a vertical quartz tube hot zone and can accommodate both single and multiple wafers. This reactor features an advanced flat-band heating system that delivers a consistent temperature profile, resulting in uniform thin film growth on both vertical and horizontal wafers. This system also has an adjustable flow rate for highly efficient film growth and a simple chamber-assist control. Additionally, variable frequency power drives and data logging capabilities are available, allowing for precise process repeatability. The reactor also features a windowed process chamber, enabling users to view the deposition process in real time. This reactor is equipped with a built-in dynamic spectrometer to measure deposition rates and film uniformity. Moreover, its advanced N2O management system is designed to reduce particle levels during the deposition process, resulting in less waste and higher yields. Additionally, APPLIED MATERIALS 0010-36162 is a reliable LP-CVD reactor with a long lifetime. The quartz tube hot zone is engineered for longer life and higher temperature capability, allowing it to meet the demands of the most challenging growth conditions. The advanced electrical and gas systems are designed for maximum efficiency with little maintenance. In summary, 0010-36162 is a reliable and efficient LP-CVD reactor designed to provide uniform, high quality growth of poly-crystalline silicon films for the semiconductor industry. Its features make it one of the most versatile and advanced LP-CVD reactors available.