Used AMAT / APPLIED MATERIALS 0010-36162W #293620937 for sale

AMAT / APPLIED MATERIALS 0010-36162W Reactor is a high-performance, high-throughput tool used for performing chemical and materials-processing operations such as chemical vapor deposition, etching, and surface modification. The reactor is a modified high-efficiency, low-temperature, direct current (DC)-driven plasma-enhanced equipment, designed for use with standard direct current power supplies. Its polysilicon liners make it ideal for deposition of metals, polymers, and other dielectric materials in the semiconductor industry. AMAT 0010-36162W reactor features an extensible, high-precision linear motion base and two ground-supported flow-dynamic anode sliders for secure motion in both directions. The reactor is fully hermetically sealed, preventing the buildup of contaminants and enabling precise chemical reactions. The unit features an enclosed chamber with a vapor supply system, enabling precise vapor delivery and superior vaporization control. The chamber design includes advanced gas-dynamic shielding insulation, which eliminates temperature stratification and enables precise chemical temperature control. An integral deposition matrix provides precise positioning of the targets at the substrate interface, while the four-zone thermal profile control unit ensures reliable thermal management. APPLIED MATERIALS 0010-36162W reactor's controllable gas machine utilizes up to six individually programmable gas inputs, allowing for multiple gaseous reactions and precise chemical control. The unit is also equipped with a time-of-flight mass spectrometer (TOF MS) and an ion pump to facilitate volatile oxidation processes and allow for the direct detection and control of reaction products. Expandable process modules are available, allowing for additional deposition capabilities and increased material throughput. 0010-36162W reactor is highly reliable, with superior control and repeatable performance even under the harshest operating conditions. The tool is fully scalable and configurable to accommodate a broad range of substrate sizes, materials, and processes, enabling maximum flexibility. Its precision, linear-motion assembly also ensures superior repeatability and stable layer consistency, and its integrated diagnostic asset can alert operators to any issues that may arise. Its cutting-edge technology and innovative design make it an ideal tool for the most demanding chemical reaction and semiconductor operations.