Used AMAT / APPLIED MATERIALS 0010-36162X #9075362 for sale

AMAT / APPLIED MATERIALS 0010-36162X is a UHV Evaporation/Sputtering Reactor used for physical vapor deposition of thin films onto a substrate such as glass, silicon, metal, or ceramic. It is designed for use on standard Class L vacuum systems such as LMS Vacuum Systems. AMAT 0010-36162X has a base pressure range from 6.7x10-7 torr to 1x10-2 torr and can be used to form electrically conductive, insulating, optical, or barrier films. APPLIED MATERIALS 0010-36162X utilizes resistance heating with the evaporant material in its powdered, granular, or flake form. Its evaporator chamber is composed of stainless steel, with the mounting fixtures made of gold plated copper. Anodized aluminum is used for the antenna rail supports and slotted cover, and PTFE coated Mylar is used for the radiation shield. The antenna carrier and ceramics for the antenna rail supports are made of corrosion resistant material such as BN, Y-ZrO2, or AlN. The evaporator also features multiple quartz monitor ports, as well as options for use of quartz crystal film thickness monitoring cells or non-destructive acoustic monitoring systems. 0010-36162X also features magnetrons and ion guns for sputter deposition. The magnetron sputtering gun provides a stable, uniform film through the use of a moving magnet field, created by combining a coil and alternating that is biased in a vacuum environment. The magnetron gun is fed material in the form of a target and is powered by DC voltage. The Ion gun, on the other hand, shoots atoms at the desired substrate by means of ions generated by the gun. Both the magnetron and ion guns are suitable for use in high or low vacuum applications and can be programmed to achieve a desired deposition thickness. Finally, AMAT / APPLIED MATERIALS 0010-36162X includes process software that allows the user to monitor the process conditions and provides automated control of the deposition rate. It also provides a range of parameter settings that enable the user to adjust the process conditions to meet their specific deposition requirements. The built-in safety features help ensure that the manufacturing process is conducted safely and efficiently. Overall, AMAT 0010-36162X is very useful for creating high quality and consistent deposition of thin films in laboratory and manufacturing environments. It features a range of components and settings to allow the user to adjust the process conditions to their needs, as well as process software for monitoring and controlling the deposition parameters. The safety features also help provide a safe and efficient deposition environment.