Used AMAT / APPLIED MATERIALS 0010-36408 #9005020 for sale

AMAT / APPLIED MATERIALS 0010-36408 reactor is an advanced semiconductor production tool designed to precisely control and execute process steps necessary to manufacture nanoscale structures with unprecedented detail. AMAT 0010-36408 reactor features a powerful, load-lock, multi-gas, multi-process capability which is optimized for use with photoresist and other novel materials. At the core of APPLIED MATERIALS 0010-36408 reactor is a 1900 Series high performance platform which offers both high uniformity and throughput, and helps reduce downtime by minimizing setup and recovery time. The load-lock design helps to maintain low-cost particle contamination control through a series of automated sealing protocols, ensuring that the substrate is isolated from external particles and airborne contaminants. The multi-gas capability, which is present in 0010-36408, allows for diverse process steps such as stripping, deposition, and etching. The inclusion of multiple flow controllers in the system helps maintain a more consistent gas flow for faster and more reliable processes. In addition, the Advanced Substrate Cleaning feature allows for the cleaning of large substrates and delicate structures, such as nanowires, without the risk of damaging them. This function utilizes the reactive ion etching process and is managed with the high precision robotic gantry system. The advanced Etch and Deposition Process of AMAT / APPLIED MATERIALS 0010-36408 allows for precise conformal coating and etching of nanoscale structures, creating the ideal patterning environment for sub-100nm patterning. This process is managed by the novel Process Optimization Software, which automates process parameters and continuously monitors process stability. The software allows for real-time adjustments and feedback and enables the reactor to create complex patterning, show and test different production scenarios, resulting in higher yields with consistent quality. AMAT 0010-36408 reactor is an effective, high performance production tool optimized for the manufacture of nanoscale structures with unprecedented detail and accuracy. The reactor combines multiple innovative features which allow for improved fabrication processes while providing a user-friendly interface that simplifies the entire production workflow. This versatile tool offers reliable, repeatable performance, making it an ideal choice for the production of nanoscale structures.