Used AMAT / APPLIED MATERIALS 0010-36408 #9026414 for sale

AMAT / APPLIED MATERIALS 0010-36408 is an advanced plasma etching reactor designed for use in microelectronic device fabrication. It is employed for containing and maintaining an ultra-high-vacuum environment within which an optically-generated plasma is used to etch and pattern a substrate surface. The reactor consists of a cylindrical chamber with a flat metal plate at its base. It features an inner wall designed to be resistant to corrosion from reactive gasses and a Faraday cage for shielding the plasma from external electric fields or magnetic noise. A multi-tiered cathode assembly is inserted into the chamber through the top plate and acts as a discharge source, collecting the electrons produced by the plasma. The cathode assembly is connected to a power supply and is capable of producing an arc discharge between the cathode and the anode (the metallic plate) up to 30kV. AMAT 0010-36408 also features a complete line of optional accessories to elevate its performance, such as etching masks, pumping port isolators, and a digital readout gas pressure regulator. An electrical heating element located in the vacuum chamber, is used to heat the reactor's components, promote uniform reaction temperatures, and improve plasma stability. The reactor is also equipped with a viewing window for monitoring the etching process. Finally, APPLIED MATERIALS 0010-36408 is calibrated at the factory to exacting standards in order to ensure reliable and consistent results. Its robust and durable construction allows it to perform reliably in a variety of different operating environments. This advanced reactor is the perfect choice for high-precision etching and patterning of substrates in the semiconductor industry.