Used AMAT / APPLIED MATERIALS 0010-36408 #9177196 for sale

AMAT / APPLIED MATERIALS 0010-36408 is an inductively-coupled plasma (ICP) reactor used in various hardware applications such as semiconductor device processing. This particulare model is valued for its modular design, allowing for the customisation of its internal components to fit the needs of a specific application. It works by creating a thermal plasma that uses sustained RF power to break down chemical elements which can then be injected into a reaction chamber. This process allows for the surface modification and cleaning of materials on a microscopic level. AMAT 0010-36408 operates by creating an axis-symmetric thermal plasma in the reaction chamber through the application of a high frequency (up to 70-MHz) radio frequency source. The high frequency source induces a current in the reaction chamber which excites the gas particles present inside. This excitation energy causes the gas particles to increase in temperature, and either ionise or dissociate, before being injected into the reaction chamber. The process is very efficient due to the efficiency of the RF source, allowing for the selective deposition of materials on the surface of a wafer in a precise and controlled manner. The reaction chamber of APPLIED MATERIALS 0010-36408 has a removable top which allows for easy access when making adjustments. An adjustable source density function is present inside the chamber, allowing for the setting of the intensity of the RF source, while simultaneously setting the temperature and pressure of the plasma. This alloows the user to precisely control the rate of deposition of the test material onto the wafer. Furthermore, safety restrictions can be set to ensure safe operation, by controlling the operation parameters. 0010-36408 also features an integrated ion source which provides additional stability to the system. The ion source supplies ionised argon gas to the reaction chamber which stabilizes the plasma distribution, allowing for a longer life of the components in the reaction chamber. Additionally, it helps to reduce the amount of thermal energy lost in the process, ensuring that the process is more efficient. As a whole, AMAT / APPLIED MATERIALS 0010-36408 is a reliable, versatile and efficient ICP reactor which is considered an essential component for many hardware applications. The highly adjustable RF source makes it suitable for precise surface utilization tasks, while the integrated ion source helps to prolong the life of its components and ensure efficient operation.