Used AMAT / APPLIED MATERIALS 0010-36408 #9358045 for sale

AMAT / APPLIED MATERIALS 0010-36408 Reactor is a versatile, high-end piece of equipment designed for surface and thin film deposition applications. The Reactor features innovations such as a helical-flow design, active gas distribution and a low-profile, self-contained ceramic shell. The design enables high uniformity of film deposition and a very low defect density. The system has a large reaction chamber and a volume of up to 0.004 m3. The uniformity of deposition is enhanced further by the innovative gas flow design, which utilizes helical and/or serpentine flow techniques to enhance gas to-surface contact. The active gas distribution equates to improved surface conditions, with low particle contamination and greatly reduced refractory metal elements in the deposited film. This in turn increases the lifetime of the deposited film, making AMAT 0010-36408 Reactor suitable for high-end, high-fidelity processes. The Reactor comes outfitted with an insertable RF source, which allows for low-pressure, low thermal budget deposition processes, making it possible for high-value coating applications. The Reactor also has a precise temperature control system, as well as a pressure control system, each of which have been designed for precision operation. The temperature range of the Reactor is designed to cover a wide range of deposition rates and temperatures, up to 1800°C, with very low noise levels. This high-performance Reactor comes with an array of automated controls, including a low-vibration ceramic bell, film mask protection, process interrupt and autobalance features. APPLIED MATERIALS 0010-36408 Reactor is suitable for a wide variety of thin film deposition needs, making it an ideal choice for high-fidelity and/or high-value coating applications. Its uniformity of film deposition and low defect density ensures consistent performance over time, making it possible for precision and repeatable results.