Used AMAT / APPLIED MATERIALS 0010-36734 #293640048 for sale

AMAT / APPLIED MATERIALS 0010-36734 reactor is an industry-leading plasma etching equipment designed for use in the semiconductor industry. It is designed for advanced etching of all types of materials, including metals and oxides. The system features a robust design, allowing for high-accuracy etching in a wide range of materials. Its wide range of control features make it an ideal choice for production volumes. AMAT 0010-36734 reactor has integrated mass flow controllers with individual gas tuning and control to ensure efficient, precision performance of each processing step. Its gas inlet unit also allows for precise control over pressure and species flow rate, further boosting its already remarkable accuracy. Additionally, the machine is equipped with a universal end-point detector, which monitors all factors across each stage of the etching process, ensuring accuracy throughout the session. APPLIED MATERIALS 0010-36734 reactor is powered by a Pulse Generator Module and gas mainframe, allowing for dynamic control of the plasmas generated during the etching process. Its cooling tool is also equipped with quick-cool mechanisms, ensuring that the asset can rapidly switch between etching processes without waiting to cool down. 0010-36734 reactor also features a process control unit and Human Interface terminal, allowing users to easily access and adjust parameters and settings during operation. AMAT / APPLIED MATERIALS 0010-36734 reactor has a 5" chamber diameter, making it an ideal choice for the production of substrates with small or intricate geometries. Thanks to its chamber, the reactor can accommodate substrates up to 2 inches in diameter, making it an excellent choice for industrial applications. It also features a built-in Faraday plate which ensures accurate control of the plasma and uniform sheath formation during the etch process. AMAT 0010-36734 reactor is also equipped with an on-board monitoring model to ensure safety and peace-of-mind during operation. This equipment constantly monitors chamber conditions such as gas pressure, gas flow, and electrode performance, allowing users to quickly detect and address potential issues. Overall, APPLIED MATERIALS 0010-36734 reactor is a powerful, reliable plasma etching system designed for professional and industrial use. With its robust design and integrated control features, it provides users with accurate and uniform results across a variety of materials and geometries. Moreover, its built-in safety features make it an ideal choice for production environments.