Used AMAT / APPLIED MATERIALS 0010-36734 #293640081 for sale

ID: 293640081
Wafer Size: 12"
Ceramic heater for Producer, 12".
AMAT / APPLIED MATERIALS 0010-36734 reactor is a semiconductor grade chemical vapor deposition (CVD) reactor designed for the fabrication of integrated circuits (ICs). This equipment is a highly specialized type of CVD reactor commonly used in materials science research, allowing for the uniform high-quality deposition of semiconductor and other high-performance materials. This specific reactor features an 8" (203.2 mm) reaction substrate, with a maximum throughput of up to 80 wafers per hour. Its heated enclosure is split into four separate zones, providing highly precise control of temperature and deposition rate. AMAT 0010-36734 reactor is equipped with a low-pressure hydrocarbon-driven dielectric source, enabling the deposition of over 50 different materials, with the addition of etch gases. The system can reach temperature ranges between 5° or 10°C with amazing speed and accuracy, while maintaining a steady flow of diminishing pressure. It employs sophisticated heating elements, sensors, valves, and gas flow control systems to ensure that all wafers and substrates receive the same amount of heat and processing time. The dynamic uniformity feature keeps the surface of the wafer uniform and evenly processed. Because of this, it produces high-quality results with minimized particle contamination. The unit is also engineered for easy operation and maintenance. It uses a Windows-based interface, consisting of hardware and software components, to provide user-friendly machine control, including automated wafer tracking and counting. Additionally, its durable construction ensures a long lifespan and low cost of ownership. The machine is corrosion-resistant and can withstand harsh operating conditions, making it very reliable. All in all, APPLIED MATERIALS 0010-36734 is the ideal CVD reactor for IC fabrication due to its excellent temperature and process control, ease of use and maintenance, and exceptional uniformity and quality of results. This reactor is sure to provide you with unmatched versatility and precision in your manufacturing process.
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