Used AMAT / APPLIED MATERIALS 0010-36734 #293806866 for sale

AMAT / APPLIED MATERIALS 0010-36734 is a physical vapor deposition (PVD) system designed to produce metal films with high accuracy and precision. The PVD coating process involves placing a material to be coated onto the substrate in a vacuum chamber, then evaporating the material using a low-energy-consumption electric arc placed within the chamber. This process allows for an even and precise deposition of the material onto the substrate, producing a film with uniform thickness and properties. AMAT 0010-36734 is a coaxial, direct current (DC) sputtering reactor designed to provide the highly accurate deposition of various metals onto the substrate. The reactor consists of a 6-capsule sputter source, a closed-loop RF power supply, a cold-gas flow controller, an upper scan table, a full-pressure mechanical pump, and a programmable process controller. The sputter source contains multiple targets housed within the coaxial-housing vessel. This is advantageous as it allows for efficient evaporation of individual materials as well as composite mixtures. The insulated vacuum chamber is equipped with a cold-gas system and a single-zone programmable process controller. Furthermore, the process controller features an automated sample placement, arcing diagnostics, and clamping pressure adjustment capabilities. Overall, APPLIED MATERIALS 0010-36734 is an efficient and effective PVD reactor designed to suit the needs of laboratory and industrial applications. The reactor is capable of producing ultra-thin metal films with uniform thickness and high-quality surface smoothness. The precise control of deposition rate and the high uniformity of the deposited film enables the use of the PVD reactor in high-end industries, such as aerospace, defense, and medical device manufacturing. The automated deposition control allows for superior product consistency and greater throughput. Furthermore, the enclosed vacuum chamber ensures exceptional environmental containment and preventative maintenance of the system.