Used AMAT / APPLIED MATERIALS 0010-38754 #9302318 for sale

AMAT / APPLIED MATERIALS 0010-38754
ID: 9302318
HR DTCU Assy.
AMAT / APPLIED MATERIALS 0010-38754 reactor is a high-performance, easily operated and maintained vapor deposition equipment designed for the creation of a wide range of thin-film materials. It utilizes a vacuum system to receive a variety of materials and create stable thin films as desired. With a robust and reliable internal design that ensures uniform thickness and repeatability of results, AMAT 0010-38754 reactor is a perfect choice for researchers and manufacturers in a variety of industries. This chemical vapor deposition (CVD) reactor features an innovative design that allows for the effective transport and processing of multiple materials in a single chamber. This is possible thanks to a reformative and multi-stage batch process. A gas-flow unit feeds in a variety of vaporized molecules which contribute to the formation of the desired thin films. The gas-flow machine also manages transference and the formation of the stable molecules that will form the film. Additionally, this efficient vapor deposition tool also controls the rate and thickness of the films being produced owing to integrated RF-heating control. APPLIED MATERIALS 0010-38754 reactor is designed with durability and convenience in mind. The exterior design of the reactor is sleek and robust. It has been tested to function under intense thermal and chemical stresses, making it dependable and reliable even when the process conditions could be hazardous to other equipment. Additionally, the integrated user interface is highly user friendly and efficient. It features a touch-screen LCD display that allows users to easily control and follow the process. With its metal coatings, inert gas purging, and high-temperature operation capabilities, 0010-38754 reactor is the ideal solution for thin-film creating projects. The versatility of the reactor makes it suitable for a wide range of thin-film applications and materials, such as oxide, silicon, and silicide coatings. All of these can be deposited with good uniformity and repeatability - meaning businesses can produce reliable and consistent results in a cost-effective manner. This makes AMAT / APPLIED MATERIALS 0010-38754 reactor an ideal choice for research, industrial, and commercial applications where high-quality results and cost savings are essential.
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