Used AMAT / APPLIED MATERIALS 0010-56201 #293666003 for sale

AMAT / APPLIED MATERIALS 0010-56201 is a reactor designed for the deposition process for semiconductor materials on a silicon wafer. This reactor is a cluster tool, allowing multiple processes to be completed in one integrated equipment, making it ideal for the deposition of advanced thin film semiconductor technology. The reactor has a lithography reticle that allows a user to pattern a substrate with a geometric pattern. The reticle is combined with the processing chamber to enable optical lithography, creating the desired pattern on the substrate. The plasma-enhanced chemical vapor deposition process is then used to deposit a thin layer of material, such as silicon dioxide or silicon nitride. The deposition can be done in a single layer or multiple layers, allowing for the production of desired properties and features on the substrate. The reactor is designed to be a highly flexible system, capable of performing multiple processes in the same chamber. One example of this flexibility is the ability to ion implant the substrate, a process that is used to add electrical charge to the substrate material to control the electronic properties of the wafers. Additional processes that can be completed in the chamber include oxidation and selective etching, enabling the fabrication of wafers with complex geometries or multiple layers. This reactor is also designed with safety in mind, featuring an air filtration unit, fire suppression machine, and emergency shutdown controls. The reactive gas delivery tool also ensures that the deposition process can be done safely and efficiently, eliminating any potential safety risks associated with chemical vapors or gases. The reactor is capable of performing a variety of processes, including metal deposition, spin coating, plasma-enhanced chemical vapor deposition, and sputtering. The flexibility and safety features make this reactor an ideal choice for any semiconductor fabrication or production facility.