Used AMAT / APPLIED MATERIALS 0010-59787 #293665751 for sale

AMAT / APPLIED MATERIALS 0010-59787 PECVD reactor is a deposition chamber designed for the deposition of thin films or layers onto substrates for a variety of electronic devices and systems. This system utilizes chemical vapor deposition (CVD) processes to deposit the desired thin film material onto the surface of a substrate. The PECVD reactor features an easy-to-use chamber design, capable of providing excellent deposition uniformity and uniform layer thickness across the entire substrate surface. AMAT 0010-59787 reactor features a single automated load/unload chamber, along with integrated power, vacuum, and gas delivery modules. This chamber is designed to provide low substrate loading and unloading times, to ensure shorter overall processing times. The chamber is also designed to reach higher process temperatures than traditional thermal CVD processes, allowing higher quality films to be produced. The reactor has been designed to offer a simple and intuitive operation, with an easy-to-follow graphical interface and a robust system architecture. The chamber has been designed to provide a wide processing window, allowing the user to adjust the temperature, pressure, and other process parameters according to their specific deposition needs. This allows users to create a wide variety of high-quality thin films. The reactive gas delivery system in this reactor utilizes a low-pressure, low-temperature chemical vapor deposition (LP-CVD) process to deposit the desired film onto the surface of the substrate. The LP-CVD process allows users to choose from a variety of reaction gases and also allows for the adjustment of the gas composition to create highly specific films. The chamber is also designed to offer an extremely uniform film deposition, with the potential for exact and repeatable film thickness profiles across the substrate surface. The chamber also has an easy-to-use controller, with a wide range of data logging and process control features, to ensure that the process is safe and produces reliable results. APPLIED MATERIALS 0010-59787 PECVD reactor is a powerful deposition chamber, offering both high-quality deposition uniformity and optimal process control, making it perfect for producing a wide range of thin film materials for electronic devices and systems.