Used AMAT / APPLIED MATERIALS 0010-70058 #293658101 for sale

AMAT / APPLIED MATERIALS 0010-70058 reactor is a highly efficient chamber equipment designed for a variety of applications in material sciences and process development, such as thin film deposition. This system is capable of delivering high-quality, uniform coatings of thin film materials and is used in various applications such as in microelectronics, data storage, and photovoltaics. AMAT 0010-70058 reactor employs a deposition chamber that features a stainless steel vacuum chamber containing high-purity alumina enclosing a removable graphite crucible. The deposition chamber also houses a precision balance beam, a rf generator, and other hardware components necessary for controlling deposition rates. This unit also includes an extensive chamber pressure control machine, contained in two separate stages. The first stage of the pressure control includes a turbomolecular pump to reduce gas background pressure and a roughing roughing throttle valve to finely adjust the pressure within the chamber. The second stage of the pressure control includes an e-beam source coupled to a Faraday cup and a mechanical gate valve to precisely control vaporization rate and chamber pressure settings. The tool utilizes the latest technologies and consists of several component parts optimized for best performance. It offers high processing rates, highly uniform layer thicknesses, and excellent stiction control. The various technologies employed in the reactor include a range of advanced infrared and ultraviolet lasers and advanced electron microscopy. For chemical vapor deposition, the reactor houses an RF generator, one or two filament feedthroughs, a quartz tube, and a gas-injection nozzle. During operation, gases are guided over the target where they interact with the heated material. As the atoms react, they deposit a film or layer of material onto the substrate. This layer can range in thickness from nanometers to micrometers depending on the material and operating parameters. In addition to chemical vapor deposition, APPLIED MATERIALS 0010-70058 reactor also supports a number of other physical vapor deposition processes, such as sputter deposition and ion beam assisted deposition. During sputter deposition, a target material is placed into the vacuum chamber and bombarded with energetic atoms. These energetic atoms then break off the surface of the material forming a thin film. Ion beam assisted deposition works by injecting a high-energy beam of ions into the chamber which then react with the target material. Overall, 0010-70058 reactor is an advanced, high-performance chamber asset designed to deliver high-quality, uniform coatings. By making use of the latest technologies, this model is able to deliver highly uniform layer thicknesses and excellent stiction control. The equipment is also capable of supporting a variety of physical vapor deposition processes, enabling it to be applied to a wide range of thin-film technologies.