Used AMAT / APPLIED MATERIALS 0010-70064 #293658125 for sale

AMAT / APPLIED MATERIALS 0010-70064 reactor is a tool for processing and depositing thin film layers on substrates for industrial and scientific applications. The reactor is used for semiconductor and thin film deposition, surface modification and related processes. The reactor has been designed to provide superior performance and process quality for production and laboratory applications. The reactor is constructed from a stainless-steel chamber with an enclosed rectangular shape. The chamber is designed for a strong and stable internal pressure and easy access for internal maintenance. The chamber has an inner area of 150 x 180 x 114 cm, allowing for a substantial capacity and high throughput rate. The reactor is ideal for a wide range of low-vacuum, high-temperature and high-vacuum processes including chemical vapor deposition (CVD), physical vapor deposition (PVD), surface modification and etching applications. One key feature is its ability to maintain the desired process atmosphere for low pressure operations and maintain vacuum levels for high pressure operations. The reactor has an internal working pressure range of 1 x 10-5 mbar up to 1000 mbar, allowing for the processing of a variety of materials. The reactor is capable of utilizing a variety of different sources for introducing reactants into the reaction chamber. These include hot wall, cold wall and cold cathode sources, all contributing to the unique process characteristics and capabilities within the chamber. AMAT 0010-70064 reactor has an excellent level of safety and pollution control features built into every unit. This includes extensive safety features, such as temperature monitoring and control, and oxygen/carbon dioxide (O2/CO2) monitoring, both of which keep the reaction chamber in safe and consistent operating conditions. Additionally, the chamber is well-insulated and designed to minimize heat loss, ensuring optimal process repeatability. Finally, all of these features help to ensure that the reactor produces high-quality results with minimal waste production. APPLIED MATERIALS 0010-70064 reactor is a powerful and reliable tool for thin film deposition. Its design and features make it ideal for a wide range of semiconductor, surface modification and etching applications. By offering superior performance, process quality and safety features, it is a great choice for any laboratory or industrial setting.