Used AMAT / APPLIED MATERIALS 0010-75004 #9389377 for sale

AMAT / APPLIED MATERIALS 0010-75004 is a high-performance, vacuum thermal Chemical Vapor Deposition (CVD) reactor used for film growth processes. It is designed for use in semiconductor production and other advanced materials manufacturing processes. This reactor offers the convenience of high-throughput film growth processing at the lowest possible cost. AMAT 0010-75004 reactor comprises a vacuum chamber, a heating source, and a gas injection system. The heated vacuum chamber is made of stainless steel with a hydrogen-resistant coating and provides a homogenous temperature profile throughout the interior. The temperature of the chamber can be easily adjusted to suit the deposition parameters. The heating source is a powerful and reliable resistive filament with a protective screen, which can be easily changed for each deposition. The gas injection system allows a wide range of gases to be introduced into the chamber, allowing for precise control of the deposition parameters. APPLIED MATERIALS 0010-75004 reactor delivers superior process uniformity and repeatability. It features an automated process controller for precise process parameter control, including pressure, temperature, flow, and gas composition. It also has an optional remote control module, allowing real-time monitoring and adjustment of the process from a computer. The chamber of 0010-75004 is equipped with a powerful venting system to maintain safe vacuum pressure. It is also equipped with an inlet showerhead to minimize particles deposition. To prevent any contamination, the reactor is equipped with a dedicated water cooler and an exchangeable protection plate. The protective plate ensures a safe and reliable operation of the reactor. AMAT / APPLIED MATERIALS 0010-75004 reactor provides a wide array of operations to suit the needs of the semiconductor manufacturing process. It offers an unprecedented high-throughput and repeatable process with high yields. The reactor can be used for a variety of film growth processes, from sputtering to epitaxy, molecular beam epitaxy, and more. AMAT 0010-75004 is suitable for advanced materials manufacturing processes, such as silicon wafer etching, silicon on insulator processing, and many others.