Used AMAT / APPLIED MATERIALS 0010-75005 #293591839 for sale

AMAT / APPLIED MATERIALS 0010-75005 is a reactor designed for light deposition of thin films. It is used in silicon and compound semiconductor depositions, as well as LED and other optoelectronic materials. The reactor has a large process chamber, with a diameter of 36 inches and a depth of 35 inches. The chamber is an inert process environment, which allows for the full range of temperatures, vacuum conditions and cleanliness levels necessary for deposition. It features a hot wall design, with a Turbo Torr pump equipment and direct frequency-based RF power supply. The hot wall design provides excellent temperature uniformity and directionally well-controlled plasma. The power supply system results in superior uniformity, dose rate and repeatability in thin film processes. It also provides greater control over the size and shape of nanostructures. This is an important feature for light deposition applications requiring precise layer thickness control. The process chamber is equipped with an electrode basket, allowing for full flexibility in electrode arrangement. This is a valuable feature for several thin film processes, such as epitaxy, where it is necessary to create self-assembled structures with precise control over the film thickness. AMAT 0010-75005 reactor also features direct drive electron guns, multilevel shutter control, process instrumentation and an automated process monitoring unit. These features ensure greater accuracy and repeatability in thin film depositions. The process parameters can be changed quickly, with no need for a manual adjustment. The automated process monitoring machine also allows for comprehensive feedback on the process state, which helps to ensure optimal performance. This helps to reduce variability, thus resulting in more consistent productions. Altogether, APPLIED MATERIALS 0010-75005 reactor is an excellent tool for light deposition processes. It provides excellent temperature uniformity, precise control over the size and shape of nanostructures, and thorough feedback on the process state, thus ensuring optimal performance and repeatability. With its wide range of features, this reactor is an ideal choice for LED and optoelectronic material depositions.