Used AMAT / APPLIED MATERIALS 0010-75005 #9389380 for sale

AMAT / APPLIED MATERIALS 0010-75005 is a single-wafer reactor designed to be used in semiconductor device fabrication. The single-wafer reactor is used as part of the thermal annealing process. It enables high temperatures in a tightly controlled environment for applications ranging from simple dopant activation to complex structural integration. AMAT 0010-75005 is composed of several components working together to create a complete equipment. It includes two vertically opposed lamps that provide uniform thermal energy to the reaction chamber. These lamps are powered by TWO power supplies, which precisely control the irradiance to a total power of up to 10kW. Additionally, the reaction chamber includes a reflector that further ensures uniform irradiation. The loadlock and a vacuum transfer mechanism enable secure loading of the single-wafer substrate using a quick-change cassette. The reactor is equipped with rapid thermal processing (RTP) technology to control parameters such as temperature, pressure, and time for precise annealing results. This results in improved device performance and reliability. APPLIED MATERIALS 0010-75005 utilizes a PC-based thermal batch processing software package to optimize the annealing process. This ensures control over the thermal process and allows for repeatability from batch-to-batch. Additionally, the reactor is designed with safety features to optimize system integrity and protect operators and personnel. 0010-75005 is a user-friendly unit with a large touch-screen panel and intuitive control menus. Vacuum control and wafer heating is managed automatically and the safety interlock machine can be set for custom parameters. Different substrates can be processed through AMAT / APPLIED MATERIALS 0010-75005, including Silicon, Gallium Arsenide, and other materials. In summary, AMAT 0010-75005 is a single-wafer reactor used for thermal annealing processes. It offers precise control over temperature, pressure, and time for improved annealing results, and enables automation for batch processes. Its safety features ensure tool integrity and protect operators and personnel. This reactor is an effective tool for semiconductor device fabrication with multiple substrates.