Used AMAT / APPLIED MATERIALS 0010-76036 #155137 for sale

AMAT / APPLIED MATERIALS 0010-76036 is a reactor designed to process materials in the semiconductor industry, such as silicon and other advanced materials. It features a large vacuum chamber that is designed to provide the ideal environment for the etching and deposition of wafers, substrates and components, as well as other semiconductor material. AMAT 0010-76036 is capable of operating at pressures from ultra-low to high ranges. It has adjustable gate and accelerating voltages that allow for precise control of the process parameters. It is equipped with both mechanical and vacuum feeders for loading and unloading substrates. It also includes a closed loop cooling equipment for cooling the chamber during the process. The system has multiple user-friendly touch-screen interfaces for the ease of operation and allows for the remote control of the process parameters. The unit can also be monitored from a distance with its wireless networking setup. APPLIED MATERIALS 0010-76036 is highly versatile and can be used to process a variety of materials, such as gallium arsenide, silicon, gallium nitride and aluminum. It is suitable for production scale as well as research and development applications. The machine also incorporates advanced safety features, such as vacuum interlocks and safe pay-off systems to prevent unsafe processes and dangerous materials from being released in the tool. It has an automatic cleaning subsystem, which ensures that the chamber remains clean and safe during operation. 0010-76036 is equipped with several customized accessories and components, such as temperature and pressure gauges, temperature sensors, and other sensors to monitor the asset's performance, as well as a variety of feeders for loading and unloading substrates. This helps in achieving consistent results for all types of materials and processes. Overall, AMAT / APPLIED MATERIALS 0010-76036 is a reliable and highly precise reactor that provides customers with superior results on virtually any etching and deposition application. It is recognized for its precise control of process parameters, complemented by its versatile design and advanced safety features, and is ideal for production as well as research and development applications.