Used AMAT / APPLIED MATERIALS 0010-77533 #293655752 for sale

AMAT / APPLIED MATERIALS 0010-77533 is an advanced reactor designed for the deposition of thin films. The reactor features a two-zone, closed-cell cross-flow design with a vertically oriented source and shield. The shield is contained within the heated-gas cell, which is heated by a high-power quartz lamp and utilizes precise control mechanisms to ensure consistent deposition of quality thin films. The heated-gas cell is designed to maintain a uniform temperature due to the utilization of a differential mass flow controller. This ensures reliable, repeatable film deposition and maintains optimal deposition conditions. The source and shield are also optimized to reduce contamination, which helps to ensure high-quality thin films with minimal variability. In order to achieve uniform film thickness, AMAT 0010-77533 reactor incorporates a three-axis armature. This armature features a rotational control system that minimizes the effects of gravity and maintains uniform deposition rates on all materials on the chamber walls. The armature is constructed of high-temperature-resistant material and is able to move up and down, side-to-side, and in and out of the process chamber to guarantee uniform thermal energy transfer to the area of deposition. The reactor is equipped with several advanced features for monitoring and controlling the deposition process. These include a precise and accurate quartz temperature controller that is able to maintain pre-set temperature ranges. This helps to ensure consistent and uniform deposition. In addition, the reactor includes Optical Emission Spectroscopy (OES) to monitor process parameters such as oxygen, argon, nitrogen, sulphur, and other gases. This ensures precise control of the deposition process and helps to improve throughput. APPLIED MATERIALS 0010-77533 reactor also offers a range of automation features for enhanced productivity and efficiency. This includes automatic power control, automatic feed rate control, and automatic shielding. The automatic power control enables repeatable and consistent performance and reduces the duration of the deposition process. Automatic feed rate control helps to improve precision and repeatability when delivering material to the deposition chamber. Finally, automatic shielding helps to reduce the risk of contamination and helps to extend component life. Overall, 0010-77533 reactor is designed to provide high-quality thin films in a safe, efficient, and repeatable manner. It features a two-zone, closed-cell cross-flow design with a vertically oriented source and shield, a quartz lamp-heated gas cell, and a three-axis armature for uniform deposition. The unit is also equipped with advanced monitoring and automation features to increase productivity and improve film quality.