Used AMAT / APPLIED MATERIALS 0010-81422 #293664188 for sale

AMAT / APPLIED MATERIALS 0010-81422 is a high-temperature chemical-vapor deposition (CVD) reactor designed and developed by motion control expert, AMAT. This powerful reactor is especially useful in process development and production of a variety of thin-film and heterostructure materials, including compound semiconductor material such as gallium nitride (GaN), indium phosphide (InP), and aluminum gallium arsenide (AlGaAs). This versatile equipment has a two-inch chamber making it suitable for a wide range of wafer geometries and is built to handle temperatures of up to 450°C. The robust and reliable reactor equipment features up to six source ports as well as gas injection and manifold systems for pumping in reactants from the low turbulence chamber. This ensures a wide range of process conditions can be used for material deposition, including an adjustable deposition rate, pulsed evaporators, and co-evaporators. Additionally, each of the ports equipped with mass flow controllers and actuated valves to allow precise control of gas flow through the chamber. The exhaust gas is also regulated with the aid of computers since it should not exceed a certain level for safety reasons. The reactor system also features an advanced control unit allowing users to quickly and easily set up processes, start running, and monitor results in real-time. This user-friendly machine consists of a touchscreen panel that displays the relevant parameters of the tool such as pressure, function, and temperature. It also provides highly reliable, real-time feedback, enabling consistent and repeatable processes. The integrated thermocouple and fan control provide further precision control over process temperature range. AMAT 0010-81422 reactor allows users to rapidly develop and produce a wide range of materials from metal-organic compounds for the semiconductor industry. With its enhanced safety and advanced control systems, high chamber temperatures, and wide array of features, this compact yet powerful reactor is ideal for applications in ultra-large-scale integration (ULSI) and compound semiconductor processing.