Used AMAT / APPLIED MATERIALS 0010-93133 #9277991 for sale

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ID: 9277991
Dome Temperature Control Unit (DTCU) With 1110-01057 RF Source matcher.
AMAT / APPLIED MATERIALS 0010-93133 is an advanced automated reactor designed for use in semiconductor fabrication. The reactor is primarily used for etching, deposition, and cleaning processes; and is used in tandem with other components of AMAT APPLIED MATERIALS Endura platform. AMAT 0010-93133 is an off-the-shelf plasma processing reactor that can be configured for a variety of applications. It features SMIF-compatible hardware to ensure efficient transport of parts between and within the equipment. The ETCH and CVD reactors enable precise control over gas flow, pressure, and temperature through the use of an integrated feedback loop. This feature allows for excellent process repeatability and reproducibility in an automated environment. The design of APPLIED MATERIALS 0010-93133 reactor includes several innovative features to enhance operational efficiency. The system features multi-chamber tools that can be configured to produce different materials from aluminum to copper. The top chamber can be sealed and pressurized for alternate applications such as the production of silicon oxide. The bottom chamber offers full RF and DC co-axial injection points for processing frequency and voltage. 0010-93133 reactor also features a high-vacuum chamber for operation in a PECVD environment. This allows for higher deposition rates and greater crystal densities. Through the use of closed-loop controllers, the plasma conditions can be adjusted for each wafer to provide a consistent deposition profile. AMAT / APPLIED MATERIALS 0010-93133 reactor also includes a computerized unit for controlling the entire process. This includes monitoring gas utilization and wafer transfer and providing real-time data on wafer temperatures and gas flow. The machine also provides advanced security and audit trails, ensuring complete accountability of the entire process. Overall, AMAT 0010-93133 is a state-of-the-art automated reactor designed for use in the semiconductor fabrication industry. It is capable of multi-chamber processes and has the ability to produce multiple types of materials. Its advanced control tool allows for precise operation and excellent process repeatability. This makes APPLIED MATERIALS 0010-93133 an invaluable tool for any semiconductor fabrication facility.
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