Used AMAT / APPLIED MATERIALS 0010-93423 #293650215 for sale

AMAT / APPLIED MATERIALS 0010-93423 is an advanced plasma etch reactor designed to perform chemical vapor deposition (CVD) processing. The reactor is a two-chamber, multi-process equipment with top and bottom chambers connected by an external vent system. It has a shallow chamber design and temperature control within each chamber allowing for independent control of process parameters. The top chamber features a high density plasma source with a powerful inductive power source. This allows for the creation of uniform and reproducible plasma, which is essential for successful etch processes. It also includes a reactive gas delivery unit for delivery of the necessary process gasses so that the desired etch parameters can be achieved. The bottom chamber contains multiple reaction targets, some of which may be insulated, and can also be fitted with additional process components or detectors. AMAT 0010-93423 is constructed in a rugged stainless steel frame and is capable of withstanding high temperatures. It also has a wide range of safety features, including rupture discs for overpressure protection, emergency exhaust systems, and emergency gas shut-off valves. The PLC features automated control and data acquisition with an on-board touch screen to access process settings and data logging capabilities. This allows users to monitor critical process parameters and adjust settings in real-time during operation. The PLC also allows for the machine to be easily integrated into a larger process monitoring or automation network, and supports both EtherCAT and Ethernet-based networks. APPLIED MATERIALS 0010-93423 is suitable for a wide range of processes and applications. It is ideal for applications involving low temperature process recipes, such as deposition of oxides, nitrides, and oxynitrides. It is also capable of performing etching on a wide range of materials, including silicon, stainless steel, InP, and SiC, and can be used to achieve high resolution and uniformity. Additionally, it is suitable for a wide range of sample sizes, making it ideal for use in research and development projects.