Used AMAT / APPLIED MATERIALS 0020-20676 #9141100 for sale

AMAT / APPLIED MATERIALS 0020-20676
ID: 9141100
Chamber blank off.
AMAT / APPLIED MATERIALS 0020-20676 is a low-pressure CVD reactor offering superior deposition uniformity, high throughput, and excellent conformality. This versatile reactor is ideal for the deposition of high-quality thin films, enabling diverse applications including semiconductor etching, nitride epitaxy, graphene production, spacer layer deposition, and more. AMAT 0020-20676 reactor equipment offers a variety of features to ensure reliable, repeatable processes each time. It features a high-performance internal three-phase power supply with a maximum power of 4.2 kilowatts and offers adjustable heating rates of up to 300°C per minute. Additionally, it has an efficient quartz tube design with a low-profile chamber window, allowing for high deposition ratios and a uniform deposition rate. Furthermore, APPLIED MATERIALS 0020-20676 is equipped with a fluid management system that enables precise control over gas flow, pressure, and temperature. The distinct design of the fluid unit makes it ideal for use in thin film deposition processes, as well as vacuum and supercritical processing. Moreover, the machine also features an advanced temperature uniformity control tool that helps ensure homogeneous temperatures across the entire processing volume. The reactor is designed for optimal safety, with an automated safety shutoff feature that will activate if any parameter exceeds its safety limits. Additionally, the reactor is designed with advanced material deposition detection technology, which enables real-time monitoring to ensure that your processes remain within the desired operating parameters. Overall, AMAT 0120-20676 reactor is an excellent choice for a wide variety of thin film deposition processes. With its advanced features, superior performance, and safety features, this versatile asset can provide reliable, repeatable results. Moreover, with a universal quartz tube design, this reactor model can be adapted to many processes and substrates, making it a reliable and versatile choice for any deposition needs.
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