Used AMAT / APPLIED MATERIALS 0040-00893 #293658095 for sale

AMAT / APPLIED MATERIALS 0040-00893 Reactor is a dual zone vertical chemical vapor deposition (CVD) reactor designed for the high volume deposition of thin films, such as semiconductors, specialty ceramics, and metalloids. This reactor uses a combination of heat and chemical precursors to deposit the material directly on a substrate, such as a silicon wafer, within two independent working zones. The reactor features two fully independent and isolated vertical zones that can individually be heated to optimize conditions specific to the material or process being used. This allows for a unique multi-zone deposition process. Each zone can be set to a different temperature to ensure an accurate and uniform deposition on the substrate, as well as to maintain temperature uniformity between substrates and different processing conditions. The lower zone houses an isothermal pyrex quartz chamber that can be programmed specifically for a variety of processes, making it suitable for many deposition techniques. Equipped with a 6-inch round substrate holder, AMAT 0040-00893 Reactor can accommodate up to 150 individual substrates for maximum efficiency. The substrate holder is designed so that any unwanted material can be easily removed without the need to vent the system. The reactor is also designed with a gas introduction system that is highly flexible and can accommodate unsaturated precursors, thus fully utilizing the two-zone deposition process. An adjustable flow range is also included so as to optimize the deposition rate of highly specific films. The Reactor is also fitted with an additional port that allows an in-situ monitoring of process parameters, allowing for increased process control and safety monitoring. Operating APPLIED MATERIALS 0040-00893 Reactor is easy, as it is designed with an intuitive control panel to monitor and adjust the parameters for efficient and safe processing. Overall, 0040-00893 Reactor is a great choice for both research and industry applications, as it is equipped to ensure uniform deposition of thin films, while also permitting safe and efficient operation.