Used AMAT / APPLIED MATERIALS 0040-07033 #293651771 for sale

AMAT / APPLIED MATERIALS 0040-07033 reactor is a substrate-processing tool designed to fabricate different kinds of semiconductor and microelectronic devices. It is widely used in the manufacturing processes of integrated circuits (ICs), optoelectronic components and microelectromechanical systems (MEMS). AMAT 0040-07033 reactor is a thermally-protected quartz tube furnace, with a glass bell chamber filled with an inert gas at atmospheric pressure, which is connected to an integrated quartz susceptor. The susceptor is raised and lowered with a lifting mechanism that is driven by an electric motor. It has an internal heating mechanism which enables the temperature to be accurately controlled. APPLIED MATERIALS 0040-07033 reactor is capable of creating a wide range of temperatures in a controlled environment, with precision up to three digits after the decimal point. The temperature control is achieved by varying the power supplied to the quartz susceptor. The reactor is used in processes such as molecular beam epitaxy (MBE), chemical vapor deposition (CVD) and atomic layer deposition (ALD). In MBE, a gas containing the required materials is introduced into the chamber, and these materials are then deposited on the substrate under the influence of an electric field. In CVD, a precursor gas is introduced into the chamber which is then subjected to a series of high temperature processes that result in the formation of the desired compound on the substrate. In ALD, thin films are deposited onto the substrate by alternating layers of precursor materials and oxidizing agents. 0040-07033 reactor is capable of achieving combination processes, such as dual-MBE/CVD/ALD. This enables the combination of thin films created by different approaches in a single process. It also permits the use of precursor materials that cannot be heated too high, as the temperature is adjusted based on the materials being used. AMAT / APPLIED MATERIALS 0040-07033 reactor is a versatile and reliable tool for the production of various complex semiconductor and microelectronic devices. Its excellent control of temperature, uniform distribution of heat, and ability to perform combination processes can help to create reliable and high-quality components.