Used AMAT / APPLIED MATERIALS 0040-53718 #293668979 for sale

AMAT / APPLIED MATERIALS 0040-53718 is a high performance plasma etch reactor designed for use with semiconductor processing. The reactor takes a low-temperature air-cooled source and applies a high-voltage RF energy field to the source, creating a plasma environment for a wide variety of etching tasks. In addition to the benefits of increased throughput and improved etch uniformity, AMAT 0040-53718 is also designed for ease of use and ease of maintenance. The reactor's source system is based on an embedded 3.5kW RF power generator. The power generator features high frequency stability and low frequency ripple, allowing for consistent etching performance. The plasma chamber itself is constructed from two copper coils, both of which are enclosed in an alumina envelope and frosted to maximize RF absorbance. This unique combination of materials enables the reactor to reach very high temperatures while maintaining excellent vacuum integrity. The interior of the chamber is configured with an inner vertical wall and a dual-feed gas manifold, providing control over gas flow and which allows for easy cleaning and maintenance. Additional features of APPLIED MATERIALS 0040-53718 include an easy to use power generator controller, a low-maintenance shutter assembly, and an integrated oven for post-etch baking. The controller enables the user to program operational parameters and can also be used to monitor and adjust the plasma parameters in real-time. The shutter assembly is designed to provide maximum pressure uniformity across the chamber while also protecting the chamber from oxidative corrosion. Finally, the oven offers post-etch baking for improved throughput and uniformity. Overall, 0040-53718 is a dependable, high-performance plasma etch reactor designed to meet the demands of today's semiconductor processing industry. From its high frequency stability power generator to its easy to maintain interior components, AMAT / APPLIED MATERIALS 0040-53718 reactor offers a complete etching solution that is reliable and cost-effective.