Used AMAT / APPLIED MATERIALS 0040-54167 #293651851 for sale

AMAT / APPLIED MATERIALS 0040-54167 is a Versalis etch reactor designed for the high-precision etching of metals. This reactor is designed for applications in the semiconductor industry, where precise etching and clean materials are imperative. The reactor features a metal chamber which is filled with an etchant solution and isolating agent, while the metal is placed in the chamber on a substrate. A high-voltage power supply is used to start the etching process, as electrons are accelerated towards the metal and the reactions that lead to etching occur. AMAT 0040-54167 reactor is equipped with a number of innovative features to ensure that etching is precise and repeatable. It contains a variable-power, low-noise power supply, allowing precise control over the power and current applied to the metal. This allows highly precise control over the etching rate, allowing the user to create reliable, repeatable etch features. Additionally, the advanced etchant system features adjustable gas injection ports and a micro-bubble upstream cooling system, both of which reduce etching time and improve the repeatability of etch results. The etching chamber is designed using ultra-high vacuum technology for maximum etching control. The chamber provides a vacuum which is up to 10 times better than conventional etching systems, allowing the reaction to take place under highly controlled conditions. The upgradeable etching atmospheric control allows the user to precisely set the atmosphere in the chamber, making sure that etching is consistently repeatable. The reactor also comes with a number of features designed to ensure safety. Multiple safety protocol systems monitor both pressure and temperature of the reaction, making sure that any dangerous conditions are avoided. Additionally, APPLIED MATERIALS 0040-54167 reactor is designed to be easily maintained and serviced, reducing downtime and preventing costly repairs. Overall, 0040-54167 reactor is a sophisticated etching tool designed for the precise etching of metals for the semiconductor industry. Its features allow for precise control over the etching process, increasing repeatability and improving safety. Its advanced etchant system and vacuum chamber design provide superior etching control, allowing users to achieve repeatability and consistency in their work. With its unique features and safety protocols, AMAT / APPLIED MATERIALS 0040-54167 reactor is a powerful and reliable tool for etching metal.