Used AMAT / APPLIED MATERIALS 0040-70247 #9225693 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom
Sold
ID: 9225693
Wafer Size: 12"
Chamber for Centura RTP, 12"
Lamp housing
Brazed
Flex flange.
AMAT / APPLIED MATERIALS 0040-70247 is a single-wafer, single-chamber, chemical vapor deposition (CVD) equipment designed for advanced nano-scale device fabrication. This reactor enables the growth of dielectric films and other advanced materials on substrates with exceptional uniformity, repeatability, and scalability. AMAT 0040-70247 reactor has a mechanically designed single-chamber which allows a continuous flow of process gas. This flexible design enables single-wafer processing with high temperature uniformity for manufacturing of ultra-thin films. The reactor is equipped with an ENEZ-1 temperature controller capable of reaching temperatures up to 1000°C. These high temperatures allow for the deposition of complex material layers such as stacked dielectric layers and planarization layers. The reactor is also features a process-interlock safety system which prevents any accidental propellant leakage or particles contamination, ensuring the safe processing of different wafer types. In addition, APPLIED MATERIALS 0040-70247 ensures accurate, temperature-independent gas distribution through its hot process gas injection orifice and deposition-rate control capabilities. The unit also includes a fully automated sequence of equipment settings, ensuring repeatability and consistent performance with different tracking modes. 0040-70247 reactor offers a Table of Additional Materials, enabling different process gases for the growth of a variety of materials and therefore the production of ultra-thin layers on substrates. Additionally, its Poly-cold Wafer as well as its high vacuum mode capabilities allows for the deposition of various materials with varying etch rates. AMAT / APPLIED MATERIALS 0040-70247 CVD reactor is a robust and versatile machine designed to meet the requirements of the most advanced nano-scale device fabrication processes. It offers optimal process control, high thermal uniformity, precise gas distribution, unmatched repeatability, and an advanced safety tool.
There are no reviews yet