Used AMAT / APPLIED MATERIALS 0041-56491 #293659985 for sale

AMAT / APPLIED MATERIALS 0041-56491 Reactor is a tool used for etching and deposition processes in the semiconductor industry. This type of reactor is a plasma thermal-processing source used to deposit and etch materials in a gas-based reaction chamber. AMAT 0041-56491 reactor is used in semiconductor Fabrication, research and academic laboratories, as well as for industrial and production processes. The reactor has a high-throughput, low cost-per-wafer etching process that offers high-quality, repeatable, and uniform etching. The reactor can be integrated with other tools in a multi-tool environment, allowing for high-throughput wafer processing with greater operational flexibility. Additionally, the reactor utilizes a proprietary multi-frequency plasma source to selectively remove material with varying etch rates. The reactor also features temperature and process control to maximize the lifetime of the wafer. Its multi-frequency high frequency plasma source also reduces wafer-to-wafer variability. With its Smart Etch Utility (SEU) software, the reactor is able to match etch rate profiles to very specific customer requirements. The reactor includes an electric box with a closed-loop power control system to minimize thermal-processing non-uniformity both on and off the wafer. The reactor utilizes several accessories to increase its functionality. They include a variety of gas inlet lines, chamber shields to protect the chuck from the plasma, and an optional vacuum load lock. This load lock allows the tool to be used for high-throughput production, increasing process efficiency and throughput. APPLIED MATERIALS 0041-56491 Reactor also features multiple methods of process monitoring. This includes comprehensive diagnostics of both the plasma and mechanical performance of the reactor. At any point during the process, the user can review the setting and parameters, and also view a record of all of the steps taken in the process. 0041-56491 Reactor is a versatile and reliable tool designed to meet the needs of the semiconductor industry. This tool is ideal for etching and deposition processes requiring precise and consistent results. Additionally, the reactor is compatible with other tools and features accessories for increased functionality and process monitoring.