Used AMAT / APPLIED MATERIALS 0041-75950 #293646578 for sale

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ID: 293646578
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AMAT / APPLIED MATERIALS 0041-75950 is a highly advanced reactor designed for semiconductor and optoelectronic device manufacturing. It is capable of manufacturing a wide range of devices, from basic integrated circuits to advance optoelectronic components. The reactor is based on a single-wafer equipment that uses a combination of high temperature and pressure to deposit materials on a single wafer substrate. It operates at temperatures as high as 2000°C. The system is enclosed in a vacuum chamber, which acts as a mechanical shield and provides a stable environmental for the manufacturing process. The reactor is equipped with several advanced features, making it ideal for advanced device production. It has an advanced wafer handling unit that enables precise wafer alignment and positioning. It also has a batch-style process control machine that ensures precise conformity of all the materials used in the process. A specialized optics tool with a high-precision sensor enables accurate control over the size and shape of each layer of material deposited during the process. The reactor is also capable of providing a range of materials at different temperatures. This includes metals, oxides, nitrides, silicones, and dielectrics. The materials are then heated to create a conformal layer with uniform thickness across the wafer's surface. This improves the consistency and quality of the final products. The asset also offers a maximum throughput of up to 1,000 wafers per hour. The reactor is highly efficient and safe, since the model is enclosed in a vacuum chamber and the process is conducted under controlled conditions. The equipment also has a self-diagnostic feature that allows it to detect any errors in the system. This ensures high levels of accuracy, resulting in maximum yield and performance. In conclusion, AMAT 0041-75950 is an advanced reactor designed for semiconductor and optoelectronic device manufacturing. Its efficient wafer handling unit and batch-style process control machine enable precise alignment and positioning of the wafers. It also offers a wide range of materials, high temperature, and high throughput capabilities. Its self-diagnostic feature ensures maximum accuracy and yield, making it an ideal choice for manufacturing device production.
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