Used AMAT / APPLIED MATERIALS 0041-75950 #293657248 for sale

AMAT / APPLIED MATERIALS 0041-75950 is a chemical vapor deposition (CVD) reactor. It is a temperature-controlled heated or cooled reactor designed to be used in thin film deposition. It is used to deposit conformal and uniform thin films on various substrates. AMAT 0041-75950 reactor consists of a reaction chamber enclosed in a vacuum-sealed container that allows for precise thermal control and efficient material transfer. The equipment is designed to operate in a range of temperatures, from room temperature up to 1000°C, which enables deposition of a wide range of film materials. The reaction chamber is equipped with a heated or cooled susceptor, a gas control system, and a thin film deposition source. The susceptor can be heated with a variety of sources, including electron bombardment, induction heating, and other sources. The gas control unit provides accurate amounts of gases to the reaction chamber during deposition, allowing for precise control of the deposition process. The thin film deposition source is used to provide a controlled amount of material to the reaction chamber, which deposits the material onto the substrate. APPLIED MATERIALS 0041-75950 reactor machine is designed to be compatible with a variety of substrates, including silicon, sapphire, quartz, and glass. It can be used to deposit a variety of thin film materials, such as silicon nitride, silicon dioxide, aluminum nitride, and other materials. The tool is designed to be user-friendly, with an easy-to-use computer interface and options for automated and manual operation. 0041-75950 reactor asset provides precise control of temperature, gas flow, and deposition rates, making it ideal for depositing films for a wide range of applications in the semiconductor, optoelectronic, and optomechanical industries. The model is built with a robust mechanical design and materials, providing reliable and safe operation. AMAT / APPLIED MATERIALS 0041-75950 reactor is the perfect tool to create high-quality thin films with precise control.