Used AMAT / APPLIED MATERIALS 0041-75950 #293657998 for sale

AMAT / APPLIED MATERIALS 0041-75950 reactor is an industrial grade thermal CVD (Chemical Vapor Deposition) reactor designed to provide the highest yield of products for maximum performance. It features an integrated work chamber design that ensures a uniform temperature profile throughout the entire deposition area of the chamber for superior quality of deposition. AMAT 0041-75950 thermal reactor uses a halogen temperature monitor and an automatic zone control equipment to maintain a uniform temperature throughout the chamber. This helps to ensure accurate deposition throughout the chamber. It has a wide range of set-points and variable temperatures that can be easy to adjust for various processes. APPLIED MATERIALS 0041-75950 reactor has an exactness temperature control system and a high quality deposition window for high accuracy and repeatability. It also has a uniform heat distribution plate to ensure uniform heat transfer throughout the chamber to reduce thermal stress. This feature helps to ensure a high uniformity of film thickness and good overall results. 0041-75950 also features a computer-controlled time-based Rf power control for precise deposition rate control. This unit, along with the integrated control machine, helps ensure that the deposition parameters are held steady throughout the entire run. AMAT / APPLIED MATERIALS 0041-75950 also features a high-velocity gas control to ensure stable gas introduction in the work chamber for maximum yield. The high-velocity gas control also helps to ensure a high quality, uniform product while providing ease of maintenance and excellent safety practices. AMAT 0041-75950 reactor features a large working space of 9" by 9" by 3" with a maximum pressure output of up to 8 atmospheres, allowing for different applications such as high-precision thin film deposition, annealing, nitride deposition, deposition of low-temperature materials, etc. It is also capable of performing complex duties such as metal-silicon oxide-silicon nitride-silicon photoresists deposition. It also includes an emergency stop button mounted on the front panel for added safety. APPLIED MATERIALS 0041-75950 reactor comes with a complete suite of accessories, including a stainless steel transfer platform for easy loading and unloading, a loading zone pre-heater to preheat samples prior to loading, a gas manifold tool, a high-voltage power supply for high-temperature deposition, a water-cooled manifold asset for cooling, a gas manifold safety model, a vacuum equipment, and a PC-based control system with integrated software for easy control and monitoring. All-in-all 0041-75950 reactor is an excellent choice for many of CVD processes due to its excellent temperature and pressure control, its high-quality deposition window and uniform heat distribution plate, as well as its overall safety and ease of use.