Used AMAT / APPLIED MATERIALS 0041-75950 #293660498 for sale

AMAT / APPLIED MATERIALS 0041-75950 is a single zone chemical vapor deposition (CVD) reactor designed to deposit high-quality thin-film materials onto a substrate. This reactor is specifically suited for the deposition of resilient and durable dielectric thin films, such as those used in electronics, energy storage devices, and for optical purposes. This CVD process involves the creation of a vapor cloud of reactant gases over the substrate to be deposited via thermal or plasma energy; this vapor cloud then condenses on and adheres to the substrate forming a thin film coating. AMAT 0041-75950 is a horizontal-style thermal CVD reactor, with a gas supply line, heating equipment, gas flow regulators, and gas sensors, as well as the deposition zone at the center of the reactor chamber. The single zone design includes a hydraulically actuated lift door, which provides a low contact surface area for the sample chamber and a non-contaminating environment. The chamber utilizes a recirculating low-turbulence gas flow, which ensures uniformity over the deposition region. The vacuum chamber for APPLIED MATERIALS 0041-75950 is rated for a pressure range of 1-10 Torr, and is fully stainless steel for corrosion resistance. The substrate holder is electrically heated to temperatures ranging from 0 - 1000°C. To ensure the correct deposition rate and layer thickness, the rate of temperature is monitored with an infrared pyrometer. 0041-75950 is designed for high process throughput and an increased life of the components due to low maintenance requirements. It is designed to run continuously and uninterrupted for a total of up to 8 hours before any maintenance is necessary. It comes with a range of safety features, including an automatic shutter system, an exhaust unit, and a built in chamber scrape machine to collect any deposition material built up on the walls of the chamber. Overall, AMAT / APPLIED MATERIALS 0041-75950 is designed for the high-quality and efficient deposition of thin film materials, making it ideal for use in the production of electronic, energy storage devices, and optical systems. This one-zone CVD reactor is an extremely reliable, efficient, and cost-effective option for the deposition of thin films.