Used AMAT / APPLIED MATERIALS 0041-75950 #293669536 for sale

AMAT / APPLIED MATERIALS 0041-75950 is an advanced plasma enhanced chemical vapor deposition (PECVD) reactor. It is designed to deposit thin films of materials onto substrates. These thin films are used in a wide variety of applications ranging from photovoltaic cells to semiconductor devices. AMAT/APPLIED has a dual frequency, inductively coupled, source-driven plasma source. This design allows for optimal control of the plasma parameters, leading to better repeatability and uniformity in the deposition process. The reactor features an integrated, variable frequency, source-driven power supply. This design allows for precise control of the frequency and power levels of the plasma. In addition, the reactor is equipped with a programmable waveform generator, allowing the user to tailor their process parameters according to their specific needs. The reactor features a horizontal magnetron source and He-gas source. This design ensures uniformity across the entire wafer, and allows for a high degree of process control. The reactor supports a wide range of reaction gases, including N2, O2, CO, and Ar. It is designed to work with standard production wafer sizes of two to eight inches in diameter. APPLIED MATERIALS/APPLIED features a modular design with the ability to easily interchange process sources. This flexibility allows the user to quickly adapt to changing substrate requirements. The reactor is also equipped with a process monitoring system, allowing the user to visualize the deposition process in real time. This helps to ensure consistent, uniform film deposits. AMAT / APPLIED MATERIALS/APPLIED is able to achieve a wide range of deposition rates, ranging from 1 to 500 nm/min. This allows for various nucleation rates, critical for deposition of high-quality thin films. The reactor is designed for high-throughput and process stability, making it ideally suited for high-volume manufacturing environments. In conclusion, AMAT 0041-75950 is a highly versatile and user-friendly PECVD reactor. It features a wide array of process sources and a modular design that allows for easy interchangeability. The reactor is designed for high-throughput and process stability, allowing for fast and reliable thin film deposition for a wide range of applications.