Used AMAT / APPLIED MATERIALS 0090-03467 #293649904 for sale

AMAT / APPLIED MATERIALS 0090-03467 Showerhead Reactor is a revolutionary piece of technical equipment designed for the deposition of thin films for a variety of purposes. The reactor consists of an upper and lower showerhead geometry, covered by an enclosed processing chamber. AMAT 0090-03467 is characterized by its large processing area, enhanced process uniformity and improved flow dynamics. The upper showerhead contains a circular array of gas delivery tips which allow dynamic gas flow distribution into the lower showerhead. The gas delivery tips are constructed of top tier material which is designed to resist corrosive materials while providing uniform gas flow throughout the process area. The tips are held in place by a retaining ring which is designed to prevent accidental removal. The lower showerhead consists of a frame which houses a number of individual slots for powder sources. The slots are adjustable which allows for fine tuning of the powder sources for a variety of material deposition processes. An inlet injector is also housed within the lower showerhead, which allows for introduction of reactive gases which aid in the thin film deposition process. The enclosed processing chamber houses the upper and lower showerhead geometries. It is constructed of high temperature stainless steel and is equipped with a thermally efficient insulation system for superior temperature control within the processing chamber. The walls of the processing chamber are lined with quartz, which allows for transmission of RF energy into the chamber and directs it to the substrates as required. APPLIED MATERIALS 0090-03467 Showerhead Reactor can be used to deposit thin films on a variety of substrates including silicon, glass and metals. The thin films can be used for a wide range of applications including thin film solar cells, optical coatings, wear resistant coatings, and conductive films. The reactor is also designed to be a user friendly and cost effective tool that allows researchers, engineers and manufacturers to quickly and reliably deposit thin films.